VTT silicon photonics driving new business growth in Finland

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VTT silicon photonics driving new business growth in Finland Timo Aalto Research Team Leader 30/11/2018 VTT beyond the obvious 1

What is silicon photonics? Generating, manipulating, guiding and using light In Photonic Integrated Circuits (PICs) processed on silicon-on-insulator (SOI) wafers Primarily single-mode (SM) components and systems

Many open access Si photonics platforms WaveGuide Si SiO 2 Si substrate PSV FiberCoupler ISIPP50G Passive + heaters Si310-PH IHP SG25_PIC IHP SG25H4_EPIC Passives + Heaters + Implanted PIN + Flip-chip Passive + heaters Actives Customized actives & Passives with EBL Photonic BiCMOS 220 nm SOI 310 nm SOI 220 nm SOI 3 µm SOI 220-500 nm SOI 220/340 nm SOI 220 nm SOI 220 nm SOI 220/300 nm SOI 220 nm SOI

Different flavours and functionalities Thick-SOI waveguides Typically 3 µm SOI SM by rib-shape Submicron waveguides Typically 220-400 nm SOI SM by size Passive PICs Passive waveguides Thermo-optic components Active PICs Modulators Photodiodes Light sources

Main application areas for Si photonics Health Care IoT & Autonomous Systems ICT Agri & Food Manufacturing & Industry 4.0 Military & Aerospace Consumer Electronics & Lighting 2500 CH4 C2H6 C2H4 2000 C2H2 Absorption * 10^6 1500 1000 500 0 3300 3310 3320 3330 3340 3350 3360 3370 3380 3390 3400 Wavelength, nm 5

Photonics integration Why? Discrete components don t scale up well into complicated systems Ludwig-Maximilians-University Munich https://www.quantum-munich.de/media/nice-photos

Combination of rib and strip waveguides Keeping light in the fundamental mode Ultra-wide wavelength range (1.2-6 µm) Ability to propagate high optical powers (>1 W) Ultra high confinement Small 0.1-0.15 db/cm loss for both waveguides Zero birefringence in (square) strip waveguides Si Si Thicker SOI has reduced sensitivity to linewidth and SOI thickness variations

Why SOI thickness and etch depth still need precise control? SM condition Directional couplers Si pedestals We use bonded SOI wafers with ion-beam-trimming Top-view of optical coupling: Target SOI pedestal 200 nm 40% etch (target) 50% etch 33% etch A. Haapalinna and T. Aalto, IEEE S3S Conference, San Francisco, Oct 2017

Small bends and mirrors for dense PICs Total internal reflection mirrors: 0.1-0.3 db loss in negligible footprint Euler bends were a breakthrough: Negligible loss in small footprint 5 µm

Wavelength (de)multiplexers Echelle gratings Asymmetric Mach-Zehnder interferometers Polarization independent 1x4 AWG: 100 GHz ch spacing, 5 nm FSR Polarization dependency <10 GHz 2-3 db loss 1x4 AWG Footprint 2x3 mm 2 TE TM Square waveguide

Modulators, switches and photodetectors Implanted heaters and contacts Heaters for >10 khz operation PIN modulation >1 MHz Ge photodiodes Ge photodetector 3 µm SOI waveguide Al Si p SiO 2 Cross 5 mw/π n 24 mw/π (no underetch) n-well on Si p-well on Ge n-well on Si

Hybrid integration of active components Lasers, amplifiers, modulators and photodetectors have been flip-chip bonded on 3 µm SOI using Au-Au thermo compression bonding 5x5 mm SOI chip with 8-ch SOA and EAM arrays EAM array being tested on SOI InP EAM test result

Hybrid VCSEL integration on 3 µm SOI VCSEL-SOI coupling with up-reflecting mirrors Measured mirror losses ~0.5 db PIC layout (2x2 cm) TE Mirror output TM 50 Gb/s 2 Tb/s

Automated wafer-level testing (WLT) Ramping up volume manufacturing requires automated WLT with simultaneous O/E testing Fully automated cassette-to-cassette tool set up in Micronova I/O coupling with up-reflecting mirrors and lensed fibers

Microwave photonics on 3 µm SOI Instantaneous frequency measurement using Kerr nonlinearity in a 35 cm long spiral Design and testing at University of Sydney (M. Pagani et al.) Measurement results Future vision for increasing the level of integration

Next R&D steps in 3 µm SOI 1. Low-loss, low-cost coupling from 3 µm SOI to SSMF arrays 3 µm SOI chip 12 µm SOI interposer Pigtailed prototype with 3 µm SOI PIC and 12 µm SOI interposer Vertical taper 12 2 µm (+ IR output)

Next R&D steps in 3 µm SOI 1. Low-loss, low-cost coupling from 3 µm SOI to SSMF arrays 2. High-speed modulators and photodetectors Fiber Integrated SSC 3 µm thick waveguide (low-loss, zero-birefringence) Evanescently coupled III-V devices (lasers, SOAs, EAMs) SIDE VIEW Thin a-si waveguide pulling light to the surface Fast (monolithic) detectors and modulators

Next R&D steps in 3 µm SOI 1. Low-loss, low-cost coupling from 3 µm SOI to SSMF arrays 2. High-speed modulators and photodetectors 3. Monolithically integrated isolator and circulator

Next R&D steps in 3 µm SOI 1. Low-loss, low-cost coupling from 3 µm SOI to SSMF arrays 2. High-speed modulators and photodetectors 3. Monolithically integrated isolator and circulator 4. Single-photon detectors and nonlinear PICs for quantum photonics DOI 10.1038/ncomms2307 https://sydney.edu.au/science/physics/ cudos/facilities/quantum-photonics.shtml

Next R&D steps in 3 µm SOI 1. Low-loss, low-cost coupling from 3 µm SOI to SSMF arrays 2. High-speed modulators and photodetectors 3. Monolithically integrated isolator and circulator 4. Single-photon detectors and nonlinear PICs for quantum photonics 5. Wafer-level packaging and photonics-electronics integration MOD1 Test Board

Growth potential in silicon photonics SiPh staff & revenue in Finland Compared to ICs, PIC technology is just starting to grow In Thick-SOI we have some unique knowhow and competence in Finland We have all that is needed to scale the SiPh revenue in Finland to >100 M by 2030 This was the hype Continued growth Saturation? Hype? 1997 2014 2016 2018 2020 2030

Some project consortia OPEC RAPSI

Thank you! @VTTFinland #VTTbeyondtheobvious 30/11/2018 VTT beyond the obvious 23