Measurement Techniques to Characterize an Ultrasonic or Megasonic Cleaning System

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Marybeth Lyons
6 years ago
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1 Putting Confidence in Ultrasound Measurement Techniques to Characterize an Ultrasonic or Megasonic Cleaning System UIA Symposium, Orlando, FL 0NDA Corporation

2 Ultrasonic Cleaning Market 1930 s - RCA discovers ultrasound can clean 1950 s - commercialization of ultrasonic cleaner Cleaning Tank Install Base hundreds of thousands Market Segments Precision: semiconductors, disk drives, LEDs, flat panel displays, solar, mobile, or other electronic devices, medical. General: jewelry, food, aerospace, automotive, other industrial components Search for a reliable measurement technique has existed for decades and continues today. 2

3 Connecting Ultrasound with Cleaning Process Variables Metrology Requirements Yield Impact Ultrasound Gas concentration Chemistry Mechanical Temperature Flow rate Process Time Acoustic Uniformity Acoustic Amplitude Frequency Particle Removal Efficiency Damage Control 3

4 Developing the Process Window Low Cleaning Efficiency Process Window Level of Damage High Acoustic Parameter 4

5 Process Challenge The most important process parameter driving the development of megasonic technologies is the need to provide a more uniform acoustic field in which the substrate is processed. - Prosys Systems 5

6 What is the ideal metrology? Meaningful Able to detect changes Trust-worthy Tool Matching Simple to Use Fast Affordable 6

7 Scorecard Optical Defect Inspection Aluminum Foil / Ceramic Ring Sonolumniscence Hydrophone Hydrophone + Scanner Correlation to Cleaning Sensitive Repeatable Accurate Ease of Use Throughput Process Compatible Cost of Ownership 7 November 10, 2011

8 Optical Defect Inspection Measurement Principle: Scattered light Condition 1 Unit of Measure(s): Defect map # of defects Particle size Condition 2 8

9 Scorecard Optical Defect Inspection Aluminum Foil / Ceramic Ring Sonolumniscence Hydrophone Hydrophone + Scanner Correlation to Cleaning - - Sensitive - - Repeatable - Accurate - Ease of Use Throughput Process Compatible Cost of Ownership

10 Aluminum Foil Test Measurement Principle: Erosion of Aluminum Before Unit of Measure(s): Visual erosion pattern After 10

11 Ceramic Ring Test Measurement Principle: Erosion of graphite on ceramic ring Unit of Measure(s): Visual inspection of color change 11

12 Scorecard Optical Defect Inspection Aluminum Foil / Ceramic Ring Sonolumniscence Hydrophone Hydrophone + Scanner Correlation to Cleaning - - Sensitive - - Repeatable - Accurate - Ease of Use Throughput Process Compatible Cost of Ownership

13 Sonoluminescence Measurement Principle: Detecting photons as byproduct of cavitation Unit of Measure(s): Photon count / seconds G. Ferrell and L. Crum, J. Acoustical Society June

14 Scorecard Optical Defect Inspection Aluminum Foil / Ceramic Ring Sonolumniscence Hydrophone Hydrophone + Scanner Correlation to Cleaning - - Sensitive - - Repeatable - Accurate - Ease of Use Throughput Process Compatible Cost of Ownership

15 Hydrophone Measurement Measurement Principle: Piezoelectric transducer converts sound pressure into electrical signal Unit of Measure(s): Voltage (time) 15

16 Cleaning Tank Probes 16

17 Hydrophone Measurement HCT Cleaning Tank Hydrophone Scanning 0NDA Software MCT Meter Ultrasonic or Megasonic Cleaning Tank Computer [ Not to scale ] 17 17

18 Acoustic Maps from Hydrophones Comparing Two Cleaning Systems, f = 850 khz System #1 Mean Pressure: 174 kpa Uniformity: 171% Pressure (kpa) Slot 25 Slot 17 Slot Slot Position System #2 Mean Pressure: 184 kpa Uniformity: 23% Pressure (kpa) Slot 25 Slot 17 Slot 8 Slot Position 18

19 Scorecard Optical Defect Inspection Aluminum Foil / Ceramic Ring Sonolumniscence Hydrophone Hydrophone + Scanner Correlation to Cleaning - - Sensitive - - Repeatable - Accurate - Ease of Use Throughput Process Compatible Cost of Ownership

20 Hydrophone Measurement HCT Cleaning Tank Hydrophone Scanning 0NDA Software MCT Meter Ultrasonic or Megasonic Cleaning Tank Computer [ Not to scale ] 20

21 Automating Hydrophone Measurement HCT Cleaning Tank Hydrophone Scanning 0NDA Software MCT Meter Ultrasonic or Megasonic Cleaning Tank Computer [ Not to scale ] 21

22 Automated Scanning for Precision Cleaning HCT Hydrophone CTS Scanner (under development) 22

23 CTS Scanner X, Y, Z scanner mounted onto wafer carrier Scanner compatible with HCT hydrophone and MCT meter Full software control Designed to be able to measure loaded systems 23

24 A short demonstration 24

25 Mapping Acoustic Distribution Uniformity = 55% Uniformity = 68% Y Z Y Z X Z X 90 mm X Uniformity = 34% Y 230 mm 180 mm Batch System f = 40 khz 25

26 Scorecard Optical Defect Inspection Aluminum Foil / Ceramic Ring Sonolumniscence Hydrophone Hydrophone + Scanner Correlation to Cleaning - - Sensitive - - Repeatable - Accurate - Ease of Use Throughput Process Compatible Cost of Ownership

27 Closing Remarks Connection between ultrasound and cleaning performance continues to be explored Complexity in wet clean processes requires acoustic control to maximize cleaning efficiency and limit damage Various measurement techniques available; still, the need for standardization exists Hydrophone measurements with automated scanning offers a quantitative and systematic approach 27

28 Putting Confidence in Ultrasound BACKUP

29 Megasonic Sweeping (Crest Subsidiary) Hydrophone Results Defect Maps 29

30 Sonoluminescence Physics Today: Mar. 12, 2012, Seth Putterman UCLA 30 November 10, 2011

31 Acoustic Pressure Uniformity f = 970 khz 200 mm 0NDA Confidential 31

32 HCT Accessories Calibration Certificate Two 9 V Batteries Data Logger (Redfish) HCT Hydrophone MCT Acoustic Meter 0NDA Confidential 32

33 Wireless Data Logger HCT Hydrophone Apple ipad with Redfish App Data Logger (Redfish) MCT Acoustic Meter 0NDA Confidential 33

34 Healthmark Sonocheck Neat, but not quantitative 34

35 Good Correlation: Al Foil Erosion and HCT Acoustic Plot + 0NDA Confidential 35

36 Comparing Various Configurations 40 khz Batch System (1) Tank Empty (2) Empty Cassette (3) Cassette with 14 Disks % Std Dev = 43.5% % Std Dev = 55.0% % Std Dev = 46.1% Σ P rms (2) = 0.7 x Σ P rms (1) Σ P rms (3) = 0.3 x Σ P rms (1) 0NDA Confidential 36

NANO-MASTER Single Wafer/Mask Cleaning Systems

NANO-MASTER Single Wafer/Mask Cleaning Systems Damage-Free Megasonic and Cleaning Technology The latest developments in Megasonic and Cleaning Technology have opened up new horizons to achieve the cleanest wafers and masks used in MEMS and Semiconductor