Be the first point of contact for worldwide customers searching for solutions.

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Ernest Marsh
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1 Company Profile

2 Be the first point of contact for worldwide customers searching for solutions. Create unique solutions. Create new value. Corporate philosophy of Lasertec Lasertec has been creating a number of unique inspection and measurement systems that feature leading-edge technologies for many years. We capture market needs at an early stage and bring high-value solutions quickly to help customers efforts at their R&D and production sites based on our proprietary technologies in applied optics. Thanks to our unique technologies, high quality, and good customer support, we have earned a good reputation and customer trust in such fields as semiconductor, energy and environment, laser microscope, and flat panel display. Lasertec will keep creating new value and contribute to the progress of society. Electronics High-speed analog/ digital circuitry Parallel image signal processing Applied Optics Technology Confocal optics Precision Image DUV/EUV Optics Mechanics Technology Processing High-precision high- Optical interferometry Image processing speed stage technology technology Defect repair & particle Defect detection elimination technology The core expertise of Lasertec that enables the successive launches of epoch-making products is its technologies in applied optics. Lasertec has accumulated its technologies through the pursuit of ultimate possibility in the use of light. The pursuit began when we started using laser as a light source to give high resolution to microscopes. Since then, we have mastered a confocal optics technology that enables the construction of a three-dimensional image that is in focus at all points. We have also succeeded in developing a DUV/EUV optics technology that is applicable to semiconductor lithography applications. The application of our expertise to ultrahigh resolution lithography has led to an interferometry technology that accurately measures the phase of light. Lasertec uses the three core technologies and other neighboring technologies in various combinations to develop products that address customer needs ahead of anyone else.

Lasertec uses its proprietary optical technologies to help customers overcome new challenges. Let s launch a product that is totally new to the world every year.

The system contributed to quality improvement and cost reduction in the semiconductor industry, achieving a higher defect detection rate (from 60% to near 100%) and a significantly reduced

Drawing on this success, we have launched more innovative products featuring unique optical technologies.

Advanced and unique products are developed in the shortest time possible At Lasertec, engineers are responsible not only for product development but also for all stages of product life

Armed with diverse experiences from these activities and highly motivated by the professional spirit, our engineers take on tough challenges.

3 Lasertec uses its proprietary optical technologies to help customers overcome new challenges. Let s launch a product that is totally new to the world every year. Spirit of the founders In October 1976, we successfully developed the world s first automated LSI photomask inspection system. The system contributed to quality improvement and cost reduction in the semiconductor industry, achieving a higher defect detection rate (from 60% to near 100%) and a significantly reduced inspection time (to 1/10 of what it used to be). It gave us a foundation for growth. Drawing on this success, we have launched more innovative products featuring unique optical technologies. A product that is totally new to the world - by upholding the spirit of the founders and redefining it, we will keep enhancing our product development capability and strive for higher growth. LSI photomask inspection system in 1976 (The Nikkan Kogyo Shimbun The Best 10 New Products Award ) New R&D Center Final tool adjustment Rapid product development and good customer support Advanced and unique products are developed in the shortest time possible At Lasertec, engineers are responsible not only for product development but also for all stages of product life cycle, i.e., planning, technology research, designing, prototyping, fabrication, delivery, installation and after-sale support. Armed with diverse experiences from these activities and highly motivated by the professional spirit, our engineers take on tough challenges. This leads to the accumulation of unique knowhow and drives our rapid product development. Technical support infrastructure for leading-edge customers worldwide Our customers leading-edge production facilities require uninterrupted full capacity operations. Lasertec s standard is to keep a 99% or higher uptime for all of its systems in use. We put in place a technical support infrastructure to provide full on-site support and prompt backup in case of emergency. Our global operations are assisting our customers production and R&D efforts. Customer support infrastructure of Lasertec Dresden Lasertec Korea Corp. Lasertec Corp. Lasertec (HQ, Japan) China Co., Ltd Lasertec Taiwan, Inc. Oregon Idaho Lasertec USA, Inc. (San Jose, CA) Texas Vermont New York

Semiconductor-related systems Systems used to inspect and measure semiconductor wafers and photomasks

which is becoming more complex and sophisticated by the introduction of new materials and new

Our mask blank inspection systems have a track record of being regarded as the de facto standard tools

We are also launching various other inspection systems to address new challenges in IC device

Lasertec systems in the semiconductor manufacturing process Photomask Maskblanks Inspection System

MATRICS X810EX Series Pellicle/Photomask Particle Inspection System PEGSIS P100 Final adjustment of a

manufacturing Wafer manufacturing Mask manufacturing Device manufacturing 3D Stack Device TSV

Lithography Process Inspection System LX330/LX530 Wafer Edge Inspection Systm EZ300 TSV Back Grinding

Inspection and Review System SICA88 Transparent Object Inspection System TROIS32/33 SiC wafer, GaN,etc.

Sensitivity (nm) 20 40 60 80 100 2002 M135060nm 2003 M2351 80nm 2002 M235090nm =Mask Blank =EUVL Mask

4 Semiconductor-related systems Systems used to inspect and measure semiconductor wafers and photomasks Lasertec provides highly accurate inspection and measurement systems essential for semiconductor manufacturing process. Our inspection and measurement systems play a crucial role in the semiconductor manufacturing process, which is becoming more complex and sophisticated by the introduction of new materials and new architectures as well as by the continuing miniaturization of IC designs. Our mask blank inspection systems have a track record of being regarded as the de facto standard tools of mask blank inspection. We are also launching various other inspection systems to address new challenges in IC device production. We are offering products that fit customer needs and strategies. Lasertec systems in the semiconductor manufacturing process Photomask Maskblanks Inspection System MAGICS Series M8650/M8651 Phase Shift/Transmittance Measurement System MPM193EX Mask Inspection System MATRICS X810EX Series Pellicle/Photomask Particle Inspection System PEGSIS P100 Final adjustment of a mask inspection system in the clean room Front end process PatternDesign Back end process Mask blank manufacturing Wafer manufacturing Mask manufacturing Device manufacturing 3D Stack Device TSV Packaging Wafer Inspection/ Review System MAGICS SeriesM5640 MURA/Film Inspection System MR300 Lithography Process Inspection System LX330/LX530 Wafer Edge Inspection Systm EZ300 TSV Back Grinding Process Measurement System BGM300 Wafer Bump Inspection and Measurement System BIM300 Wafer SiC Wafer Inspection and Review System SICA88 Transparent Object Inspection System TROIS32/33 SiC wafer, GaN,etc. Evolution of IC design rules and timely product launches by Lasertec Mask Blank Inspection System Sensitivity (nm) M135060nm 2003 M nm 2002 M235090nm =Mask Blank =EUVL Mask Blank 2008 M736030nm 2007 M664060nm 2014 M8350/M nm M6640S/M6641S 50nm 2017 M8650/M nm M8650/M8651 is a new MAGICS series mask blank inspection system that meets N7 requirements st mask blank inspection system 150nm (year) DRAM design rule A sample review image from M8650/M8651

Systems for higher energy efficiency and better environment Systems used to inspect various

batteries Lasertec is also providing systems that contribute to higher energy efficiency and

We offer a highly sensitive inspection system for SiC devices, which are expected to become

For photovoltaic (PV) cells, which are widely used as a renewable energy source, we have a

unique measurement system that can reveal coating thickness non-uniformities as well as one that

High sensitivity detection of defects on SiC and GaN wafers SiC wafer inspection and review

epitaxial film, both at the same time Highly accurate and detailed automatic defect

of defects on wide-bandgap semiconductors and various transparent wafers made of sapphire,

Defect map and histogram MAP Series Contributing to PV cell conversion efficiency improvement PV

tomography (CT)-based high-speed mapping of electric current density distribution under

user-specified area or point Various mapping options including Pmax, Voc, FF, Rs and Rsh

non-uniform efficiency distribution and detection of shunt, BSFE, and other defects PV cell

characteristics for entire surface or for user-specified area or point Featuring a line

measurement in narrow areas Analysis of the distribution of diffusion and front/back surface

photovoltaic materials (based on the distribution of doping materials such as EVA and wavelength

Technology Identification of process failures using Rs map Source: NAMICS Corporation EVA

5V) EQE distribution measurement for Average EQE and spectral an entire PV cell surface

Technology For electrode coating process control and for analyzing charge/discharge

ECCS B310 In-situ observation of electrochemical reactions inside a charging/discharging battery

5 Systems for higher energy efficiency and better environment Systems used to inspect various transparent wafers, and systems used to inspect and measure photovoltaic cells and lithium ion batteries Lasertec is also providing systems that contribute to higher energy efficiency and better environment. We offer a highly sensitive inspection system for SiC devices, which are expected to become power semiconductors of the next generation. For photovoltaic (PV) cells, which are widely used as a renewable energy source, we have a high-speed visualization system that measures conversion efficiency distribution, a key performance indicator. For lithium ion batteries, which are being developed as an automotive power source, we provide a unique measurement system that can reveal coating thickness non-uniformities as well as one that helps analyze the characteristics of component materials. High sensitivity detection of defects on SiC and GaN wafers SiC wafer inspection and review system SICA88 High sensitivity detection of surface defects and crystallographic defects under epitaxial film, both at the same time Highly accurate and detailed automatic defect classification (ADC) Transparent object inspection system TROIS32/33 High sensitivity detection of defects on wide-bandgap semiconductors and various transparent wafers made of sapphire, quartz and others Effective tool of epitaxial growth process control Defects captured by SICA88 Defect map and histogram MAP Series Contributing to PV cell conversion efficiency improvement PV cell conversion efficiency distribution measurement system MP15/50 MP15 (desktop type) Computed tomography (CT)-based high-speed mapping of electric current density distribution under user-specified bias voltage Visualization of I-V characteristics for entire surface or for user-specified area or point Various mapping options including Pmax, Voc, FF, Rs and Rsh Non-destructive, non-contact inspection and measurement for R&D or production Visualization of non-uniform efficiency distribution and detection of shunt, BSFE, and other defects PV cell spectral response distribution measurement system SR15 Measurement of spectral response and QE characteristics for entire surface or for user-specified area or point Featuring a line illumination for achieving a high S/N ratio and a minimum resolution of 100μm for enabling measurement in narrow areas Analysis of the distribution of diffusion and front/back surface passivation effect on crystalline PV cells Evaluation of spectral characteristics of photovoltaic materials (based on the distribution of doping materials such as EVA and wavelength shifters Identification of shunts using reverse bias voltage (-15V) Source: Toyota Institute of Technology Identification of process failures using Rs map Source: NAMICS Corporation EVA barrier analysis after dump heat (0.5V) EQE distribution measurement for Average EQE and spectral an entire PV cell surface (wavelength 500nm) response for a PV cell Source: Konagai Laboratory, Tokyo Institute of Technology For electrode coating process control and for analyzing charge/discharge characteristics of lithium ion batteries Electrochemical reaction visualizing confocal system ECCS B310 In-situ observation of electrochemical reactions inside a charging/discharging battery Visualization of lithium ion intercalation Quantification of the expansion and contraction of active materials Analysis of dendrite formation mechanism Coating thickness scanning system TSS20 For higher performance of lithium ion batteries Management of slurry condition and viscosity uniformity Fine tuning of die coater (gap width, pump pressures, etc.) Management of press roll accuracy Progress of electrochemical reactions on a graphite anode inside a lithium ion battery being charged 0% charged 33% charged 50% charged 75% charged 100% charged Example of distribution of slurry coating Distribution measured with capacitance sensor Horizontal lines - coating errors Black spots - peeled coating White spots - coating clusters

HYBRID confocal microscope White light confocal and laser confocal in one body HYBRID is a multifunctional high-performance confocal microscope

Microscopes are expected to be more multifunctional and better performing because of their widening applications and nanometer-scale

Lasertec s confocal microscope, HYBRID, features 2 different optics in one body to provide high accuracy in wide field-of-view (at low

Using a white light, HYBRID can perform interferometry measurement and spectroscopic reflectometry measurement.

HYBRID is widely used for R&D and quality control in various industrial fields, including semiconductors, metals, resins, new materials and

Integrating 6 functions in one body and covering a full range of observation and measurement needs White Light Confocal Special features of

in micrometer scale World's first hybrid optical microscope with 2 optical systems for more diverse applications Special features of laser

All-in-One Laser confocal Phase shift interferometry Verticallyscanned white light interferometry Multifunctional and high performance

White Light Confocal Industry-leading accuracy and repeatability High magnification and high resolution observation Wavelength selection to

150µm Sample: Si wafer backside (FOV 75μm) Concept of multilayer observation based on wavelength selection Sample: Scales of butterfly Width: 6.

6 HYBRID confocal microscope White light confocal and laser confocal in one body HYBRID is a multifunctional high-performance confocal microscope that features 2 different light sources - white light and laser light - in one body to provide both wide field-of-view and high resolution. Microscopes are expected to be more multifunctional and better performing because of their widening applications and nanometer-scale measurement needs. Lasertec s confocal microscope, HYBRID, features 2 different optics in one body to provide high accuracy in wide field-of-view (at low magnification) while offering high resolution at high magnification. Using a white light, HYBRID can perform interferometry measurement and spectroscopic reflectometry measurement. HYBRID also uses a laser light to provide high resolution images in non-contact observation of extremely small structures at high magnification. HYBRID is widely used for R&D and quality control in various industrial fields, including semiconductors, metals, resins, new materials and high performance films. Integrating 6 functions in one body and covering a full range of observation and measurement needs White Light Confocal Special features of white light confocal Clear 24 bit full-color observation Wide field-of-view observation and measurement Transparent film thickness measurement in micrometer scale World's first hybrid optical microscope with 2 optical systems for more diverse applications Special features of laser confocal High magnification High resolution High contrast Differential interferometry White light confocal Spectroscopic reflectometry All-in-One Laser confocal Phase shift interferometry Verticallyscanned white light interferometry Multifunctional and high performance unmatched by non-hybrid miscroscopes For a wider range of observation and measurement needs Observation Measurement Scanning laser microscope White Light Confocal Industry-leading accuracy and repeatability High magnification and high resolution observation Wavelength selection to meet a wide range of applications High-resolution full-color confocal observation Height measurement based on confocal technology 3D image FOV 150µm Sample: Si wafer backside (FOV 75μm) Concept of multilayer observation based on wavelength selection Sample: Scales of butterfly Width: 6.4µmHeight: 8.2µm Sample: Accelerometer Wider, higher and easier Wide measurement range and high accuracy Automated measurement of bumps Digital microscope SEM AFM Typical scanning laser microscope Interferometric surface profiler Seamless measurement from the millimeter scale to the nanometer scale HYBRID performs automated measurement using its auto-measurement software and motorized stage. Once you set a recipe, the system automatically measures width, height and roughness of patterns on such samples as semiconductors and crystal substrates.

FPD-related systems Systems used to inspect defects on FPD photomasks and mask blanks Lasertec provides state-of-the art

Lasertec s inspection systems support innovations in liquid crystal and other flat panel display (FPD) technologies and

Our FPD photomask inspection systems have a track record of being regarded as de facto standard tools.

We upgrade the defect detection performance of our inspection systems in response to the introduction of finer patterns.

Lasertec systems used in FPD manufacturing process FPD Photomask Inspection System for G10 LI series LI712 FPD Photomask

manufacturing Cell process Module process Color filter process FPD Mask Blanks Inspection System LBIS Series L852/L1052 Pellicle

higher-resolution and larger-sized panels Sensitivity (μm) 0.35 Photomask inspection systems 2012 CLIOS 0.5 0.

7 FPD-related systems Systems used to inspect defects on FPD photomasks and mask blanks Lasertec provides state-of-the art inspection systems to support innovations in FPD technology. Lasertec s inspection systems support innovations in liquid crystal and other flat panel display (FPD) technologies and facilitate the adoption of higher resolution FPDs. Our FPD photomask inspection systems have a track record of being regarded as de facto standard tools. We also offer a full lineup of solutions to cover inspection needs of the processes before and after photomask inspection. We upgrade the defect detection performance of our inspection systems in response to the introduction of finer patterns. We pride ourselves on making significant contributions to the quality improvement of FPD photomasks. Lasertec systems used in FPD manufacturing process FPD Photomask Inspection System for G10 LI series LI712 FPD Photomask Inspection System CLIOS G821 Glass for array Array manufacturing process Mask blank manufacturing Pattern design Mask manufacturing Cell process Module process Color filter process FPD Mask Blanks Inspection System LBIS Series L852/L1052 Pellicle Inspection and Mounting System for LI712 71PA/71PP Glass for color filter Evolution of Lasertec systems in response to higher-resolution and larger-sized panels Sensitivity (μm) 0.35 Photomask inspection systems 2012 CLIOS photomask size (mm MD MD LI Defect on photomask (0.3μm) st LCD mask inspection system MD (year) Generation G1 300x300 Photomask size (mm) G2 360x465 G3 550x650 G4 G5 G6 680x x x x x2460 G7 G8 G x3050 mm Optics the centerpiece of inspection system

Company Outline Name Lasertec Corporation Corporate office 2-10-1 Shin-yokohama, Kohoku-ku, Yokohama, 222-8552, Japan Capital 931 million yen Founded July 1960 Business Development, manufacturing,

FPD related systems Main Banks The Bank of Tokyo-Mitsubishi UFJ The Sumitomo Mitsui Banking Corp.

(America) Head office: San Jose, CA Phone: +1-408-437-1441, Fax: +1-408-437-1430 Offices: Texas / Idaho / Vermont / New York / Oregon Lasertec USA, Inc.

Lasertec Taiwan, Inc. (Taiwan) Phone: +886-3-657-9120, Fax: +886-3-657-9122 Lasertec China Co., Ltd. (Shanghai) Phone:+86 21-5083 0806, Fax:+86 21-5082 9969 Inquiry by e-mail: sales@lasertec.co.

8 Company Outline Name Lasertec Corporation Corporate office Shin-yokohama, Kohoku-ku, Yokohama, , Japan Capital 931 million yen Founded July 1960 Business Development, manufacturing, sale and service of the following products 1.Seniconductor-related systems 2.Energy and Environment-related products 3.Laser Microscopes 4.FPD related systems Main Banks The Bank of Tokyo-Mitsubishi UFJ The Sumitomo Mitsui Banking Corp. Milestones Contact Information Lasertec Corporation (Global Headquarters) Phone: , Fax: Lasertec USA, Inc. (America) Head office: San Jose, CA Phone: , Fax: Offices: Texas / Idaho / Vermont / New York / Oregon Lasertec USA, Inc. Zweigniederlassung Deutschland (Europe) Office: Dresden, Germany Phone: , Fax: Lasertec Korea Corporation (Korea) Phone: , Fax: Lasertec Taiwan, Inc. (Taiwan) Phone: , Fax: Lasertec China Co., Ltd. (Shanghai) Phone: , Fax: Inquiry by sales@lasertec.co.jp 1960 Yasushi Uchiyama founds Tokyo ITV Laboratory, a firm engaged in X-ray television in X-ray television development NJS Corporation is established and starts exploring a wide range of technology development besides X-ray television Reticle inspection system receives Ten Best New Products Award from Nikkan Kogyo Shimbun (Business & Technology Daily News) NJS Corporation is renamed as Lasertec Corporation. Lasertec U.S.A., Inc. is established in San Jose, CA Lasertec is listed on the OTC stock market (code 6920) LSI photomask inspection system receives Ten Best New Products Award from Nikkan Kogyo Shimbun (Business & Technology Daily News) Lasertec Korea Corporation is established in Seoul, Korea. The world s first LSI photomask inspection system is developed and launched. The world s first color laser scanning microscope is developed and launched. Large FPD photomask defect inspection system, 20MD Series, is developed and launched. Automated LCD color filter inspection system and automated repair system are developed and launched. The world s first phase shift measurement system is developed and launched. Mask blank inspection system, MAGICS Series, is developed and launched 2002 Lasertec Corporation receives ISO9001: 2000 certification Lasertec is listed on JASDAQ New corporate head office and R&D center is inaugurated in Shin-yokohama. Photomask defect inspection system, MATRICS Series, is developed and launched. Corporate office-r&d center Lasertec Taiwan, Inc. is established in Hsinchu, Taiwan Lasertec is listed on the second section of the Tokyo Stock Exchange Lasertec is listed on the first section of the Tokyo Stock Exchange. Lasertec receives Commissioner of the Japan Patent Office Award as a company making good use of the industrial property rights system. PV cell conversion efficiency distribution measurement system, MAP Series, is developed and launched. SiC wafer inspection and review system, SICA, is developed and launched. Lithography process inspection system, LX330, is developed and launched ECCS B310 receives Ten Best New Products Award from Nikkan Kogyo Shimbun (Business & Technology Daily News) Lasertec China Co., Ltd. is established in Shanghai, China. The world's first EUV mask blank inspection & review system using EUV light (13.5nm wavelength) is developed and launched CM025 Lasertec corporate head office was ISO 9001 certified in April Head Office Shin-yokohama, Kohoku-ku, Yokohama, , JapanPhone: Fax: Lasertec USA, Inc Gateway Place, Suite 430 San Jose, CA USAPhone: Fax: Lasertec USA, Inc. Zweigniederlassung Deutschland Freiberger Str. 39, Dresden, GermanyPhone: Fax: Lasertec Korea Corp. #1002, Dongtanbanseok-ro 134, Hwaseong-si, Gyeonggi-do, Korea, 18455Phone: Fax: Lasertec Taiwan, Inc. 9F-3, No.8, Ziqiang S. Rd., Zhubei City, Hsinchu County 302, Taiwan (R.O.C.)Phone: Fax: Lasertec China Co., Ltd. Building2 1st Floor unit1101 Sunplus Building 1077 ZuChongZhi Road, Zhang Jiang Hi-Tech Park, Pudong New Area, Shanghai, China Phone: Fax

Create unique solutions. Create new Value. Company Profile

Create unique solutions. Create new Value. Company Profile Be the first point of contact for worldwide customers searching for solutions. Create unique solutions. Create new value. Corporate philosophy